In a semiconductor fabrication facility, an ion implanter uses a beam of doubly-charged phosphorus ions (P2+\text{P}^{2+}P2+) to dope a silicon wafer. If the beam carries a steady current of 80 mA, how many phosphorus ions hit the wafer in 1.5 minutes1.5\text{ minutes}1.5 minutes?
3.8×10173.8 \times 10^{17}3.8×1017
2.3×10192.3 \times 10^{19}2.3×1019
4.5×10194.5 \times 10^{19}4.5×1019
9.0×10199.0 \times 10^{19}9.0×1019
